Engineering & Materials Science
Atomic layer deposition
85%
Electronic properties
42%
Electrons
27%
Hafnium oxides
48%
Helium
31%
High resolution electron microscopy
47%
Lanthanum oxides
50%
Oxygen
44%
Photoelectron spectroscopy
47%
Plasmas
51%
Substrates
19%
Thin film transistors
35%
Ultraviolet spectroscopy
48%
Valence bands
100%
X rays
25%
Zinc oxide
73%
Chemical Compounds
Amorphous Structure
33%
Amount
11%
Atomic Layer Epitaxy
64%
Band Offset
88%
Dioxygen
27%
Electron Particle
15%
Electronic Property
22%
Hafnium Atom
33%
Liquid Film
13%
Oxide
15%
Plasma
34%
Surface
8%
Ultra-Violet Photoelectron Spectroscopy
35%
Valence Band
61%
Zinc Oxide
54%
Physics & Astronomy
alignment
43%
atomic layer epitaxy
57%
electron microscopy
5%
electronics
3%
electrons
2%
hafnium oxides
9%
helium plasma
9%
high resolution
4%
lanthanum oxides
10%
oxygen
8%
photoelectric emission
6%
spectroscopy
3%
thin films
3%
transistors
5%
valence
10%
x rays
3%
zinc oxides
53%