Tungsten/boron nitride multilayers for X-UV optical applications

Keyphrases

• Boron 100%
• Tungsten 100%
• Boron Nitride 100%
• Structural Quality 100%
• Optical Applications 100%
• BN Layer 100%
• H-BN Films 100%
• Nitrogen Partial Pressure 100%
• Nitride multilayers 100%
• Low Surface Roughness 100%
• Structural Properties 50%
• Good Quality 50%
• Chemical Properties 50%
• X-ray 50%
• Scanning Electron Microscopy 50%
• Low Nitrogen 50%
• Ellipsometry 50%
• Interdiffusion 50%
• Stoichiometry 50%
• Light Elements 50%
• X-ray Scanning 50%
• Nitrided Layer 50%
• X-ray Fluorescence Spectrometry 50%
• X-ray Reflectivity 50%
• Boron Nitride Film 50%
• Attractive Potential 50%
• Reflection Electron Microscopy 50%
• Deposition Pressure 50%
• K-line 50%
• In Situ Kinetics 50%
• Total Deposition 50%
• Water Window 50%
• X-ray Mirrors 50%
• Maximum Reflectivity 50%

Material Science

• Film 100%
• Tungsten 100%
• Boron Nitride 100%
• Surface Roughness 66%
• Boron 66%
• Scanning Electron Microscopy 33%
• Reflectivity 33%
• Structural Property 33%
• X-Ray Fluorescence Spectroscopy 33%

Physics

• Boron Nitride 100%
• X Ray 100%
• Surface Roughness 66%
• Stoichiometry 33%
• Scanning Electron Microscopy 33%
• X-Ray Fluorescence Spectroscopy 33%
• Ellipsometry 33%
• Reflectance 33%