Engineering & Materials Science
Plasma enhanced chemical vapor deposition
100%
Microwaves
62%
Oxides
60%
Surface roughness
58%
Inversion layers
24%
Rapid thermal annealing
21%
Atomic force microscopy
17%
Fourier transform infrared spectroscopy
17%
Temperature
16%
Oxide semiconductors
16%
MOSFET devices
16%
Silica
14%
Transmission electron microscopy
14%
Capacitors
11%
Silicon
11%
Metals
9%
Physics & Astronomy
surface roughness
59%
vapor deposition
54%
microwaves
47%
oxides
43%
roughness
34%
metal oxide semiconductors
28%
confining
14%
infrared spectroscopy
12%
temperature
12%
capacitors
12%
inversions
11%
field effect transistors
11%
silicon dioxide
10%
atomic force microscopy
10%
reactors
10%
transmission electron microscopy
9%
high resolution
8%
annealing
8%
silicon
7%