Solution processed large area surface textures based on dip coating

Wang Yuehui; Hongjun Yang; Li Chen; Weidong Zhou; Meng Tao; Guo Qing

doi:10.1109/NANO.2008.230

Solution processed large area surface textures based on dip coating

Wang Yuehui, Hongjun Yang, Li Chen, Weidong Zhou, Meng Tao, Guo Qing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We report here the dip coating processes for the formation of large area self-assembled monolayer of micro-sized silica spheres, on glass and on silicon substrates. The self-assembled structure and its spatial extent of monolayer were significantly influenced by the concentration of the suspension and the type of solvent, dip coating withdrawal speed, sample immersion time, relative humidity and substrate types. Record large areas of uniformly coated structures were formed with dimensions of 3×10 mm² and 1.5×11 mm² on the silicon and glass substrates, respectively. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where dip coating can be used.

Original language	English (US)
Title of host publication	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Pages	771-774
Number of pages	4
DOIs	https://doi.org/10.1109/NANO.2008.230
State	Published - 2008
Externally published	Yes
Event	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO - Arlington, TX, United States Duration: Aug 18 2008 → Aug 21 2008

Publication series

Name	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Other

Other	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Country/Territory	United States
City	Arlington, TX
Period	8/18/08 → 8/21/08

ASJC Scopus subject areas

Electrical and Electronic Engineering

Access to Document

10.1109/NANO.2008.230

Cite this

Yuehui, W, Yang, H, Chen, L, Zhou, W, Tao, M & Qing, G 2008, Solution processed large area surface textures based on dip coating. in 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO., 4617212, 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO, pp. 771-774, 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO, Arlington, TX, United States, 8/18/08. https://doi.org/10.1109/NANO.2008.230

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abstract = "We report here the dip coating processes for the formation of large area self-assembled monolayer of micro-sized silica spheres, on glass and on silicon substrates. The self-assembled structure and its spatial extent of monolayer were significantly influenced by the concentration of the suspension and the type of solvent, dip coating withdrawal speed, sample immersion time, relative humidity and substrate types. Record large areas of uniformly coated structures were formed with dimensions of 3×10 mm2 and 1.5×11 mm2 on the silicon and glass substrates, respectively. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where dip coating can be used.",

author = "Wang Yuehui and Hongjun Yang and Li Chen and Weidong Zhou and Meng Tao and Guo Qing",

year = "2008",

doi = "10.1109/NANO.2008.230",

language = "English (US)",

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PY - 2008

Y1 - 2008

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AB - We report here the dip coating processes for the formation of large area self-assembled monolayer of micro-sized silica spheres, on glass and on silicon substrates. The self-assembled structure and its spatial extent of monolayer were significantly influenced by the concentration of the suspension and the type of solvent, dip coating withdrawal speed, sample immersion time, relative humidity and substrate types. Record large areas of uniformly coated structures were formed with dimensions of 3×10 mm2 and 1.5×11 mm2 on the silicon and glass substrates, respectively. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where dip coating can be used.

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M3 - Conference contribution

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T3 - 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

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ER -

Solution processed large area surface textures based on dip coating

Abstract

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