Single-Interface and Quantum-Well Heterostructure MISFET's

Richard A. Kiehl

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


The physical operation of heterostructure metal-insulator-semiconductor field-effect transistors (H-MISFET's) is described and compared with that of more familiar heterostructure FET's. Undoped, doped-channel, and quantumwell MISFET's based on AIGaAs/GaAs heterostructures are examined. Focus is placed on quantumwell MISFET's, which differ most from more conventional devices. Results of experiments and simulations are presented to examine the physical mechanisms related to charge-control, gate leakage, device geometry, short-channel effects, buffer leakage, and electron trapping in the devices, and the advantages of other III—V materials systems are discussed. Finally, the potential advantages of H-MISFET's for circuit applications are discussed.

Original languageEnglish (US)
Pages (from-to)1304-1314
Number of pages11
JournalIEEE Transactions on Microwave Theory and Techniques
Issue number9
StatePublished - Sep 1989
Externally publishedYes

ASJC Scopus subject areas

  • Radiation
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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