@inproceedings{152f1e8a29eb46a9add67aa845b8a277,
title = "Si(100) surface corrosion by NH4F studied using high spatial resolution secondary electron imaging in a UHV-STEM",
abstract = "Corrosion of the Si(100) surface by concentrated NH4F solutions was studied using high spatial resolution secondary electron imaging in an ultra-high vacuum scanning transmission electron microscope. Various corrosion mechanisms were investigated by varying the ex-situ chemical treatment of the samples. Entirely different surface morphologies were obtained for surfaces that were kept in solution for short times (approximately minutes) vs. long times (approximately 24 hours) and surfaces which were rinsed in DI H2O vs. those which weren't . These measurements confirm that corrosion continues after the samples are removed from the solution and seems to be correlated with the formation of the Si hexafluorometallate salt. This salt is extremely electron beam sensitive and desorbs in UHV at temperatures below 250 °C.",
author = "Jeffery Drucker and A. Bandari and Veronica Burrows",
year = "1993",
language = "English (US)",
isbn = "1558992138",
series = "Materials Research Society Symposium Proceedings",
publisher = "Publ by Materials Research Society",
pages = "479--484",
editor = "Higashi, {Gregg S.} and Irene, {Eugene A.} and Tadahiro Ohmi",
booktitle = "Surface Chemical Cleaning and Passivation for Semiconductor Processing",
note = "Proceedings of the 1993 Spring Meeting of the Materials Research Society ; Conference date: 13-04-1993 Through 15-04-1993",
}