Scanning system for high-energy electron diffractometry

A. S. Avilov, A. K. Kuligin, U. Pietsch, John Spence, V. G. Tsirelson, J. M. Zuo

Research output: Contribution to journalArticlepeer-review

18 Scopus citations


A new electron diffractometer with a diffraction-pattern scanning system in front of a fixed counter has been developed. Significant improvement was achieved in the measured diffraction intensities by using fast electronics and additional control of the stability of the electron beam. The measurement of and accounting for the gear-frequency characteristic of the registration system was performed, and the signal accumulation mode for intensity measurements together with advanced statistical data processing were employed. Good agreement between the experimental and Hartree-Fock structure factors for LiF, NaF and MgO was achieved (to avoid strong extinction effects, rather thin polycrystalline films were used as samples).

Original languageEnglish (US)
Pages (from-to)1033-1038
Number of pages6
JournalJournal of Applied Crystallography
Issue number6
StatePublished - 1999

ASJC Scopus subject areas

  • Biochemistry, Genetics and Molecular Biology(all)


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