TY - GEN
T1 - Scalable Nanoimprint Manufacturing of Multi-layer Metasurfaces for Compact Polarimetric Imaging System
AU - Choi, Shinhyuk
AU - Zuo, Jiawei
AU - Das, Nabasindhu
AU - Yao, Yu
AU - Wang, Chao
N1 - Publisher Copyright:
© Optica Publishing Group 2023.
PY - 2023
Y1 - 2023
N2 - We demonstrate a scalable approach to fabricate multiple layers of metasurfaces by nanoimprint lithography (NIL), and further integrate the metasurface structures on ultra-compact polarimetric imaging system. The approach can significantly reduce the processing time and cost in manufacturing large-scale optical devices, in the meanwhile minimizing optical loss from defects and roughness in conventional fabrication.
AB - We demonstrate a scalable approach to fabricate multiple layers of metasurfaces by nanoimprint lithography (NIL), and further integrate the metasurface structures on ultra-compact polarimetric imaging system. The approach can significantly reduce the processing time and cost in manufacturing large-scale optical devices, in the meanwhile minimizing optical loss from defects and roughness in conventional fabrication.
UR - http://www.scopus.com/inward/record.url?scp=85176328596&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85176328596&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:85176328596
T3 - 2023 Conference on Lasers and Electro-Optics, CLEO 2023
BT - 2023 Conference on Lasers and Electro-Optics, CLEO 2023
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2023 Conference on Lasers and Electro-Optics, CLEO 2023
Y2 - 7 May 2023 through 12 May 2023
ER -