Abstract
Reversible stress changes observed during interruptions of Volume-Weber growth of thin films are phenomenologically similar in the pre-coalescence and post-coalescence growth regimes. The stress reversibly relaxes in the tensile direction in both regimes, and the magnitude of the reversible stress change increases with increasing pre-interruption deposition rates in both regimes. In addition, the initial rate of stress change during a growth interruption is slower than the initial rate stress change when growth is resumed. This paper demonstrates that high-sensitivity stress measurement with high temporal resolution provides a powerful tool for probing dynamic atomic processes during film growth.
Original language | English (US) |
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Pages (from-to) | 1011-1020 |
Number of pages | 10 |
Journal | Journal of Applied Physics |
Volume | 95 |
Issue number | 3 |
DOIs | |
State | Published - Feb 1 2004 |
Externally published | Yes |
ASJC Scopus subject areas
- General Physics and Astronomy