Recent studies of thin films and surfaces by high-Resolution electron microscopy

David Smith; Rob W. Glaisher; Z. G. Li; Ping Lu; Martha McCartney; S. C Y Tsen; A. K. Datye

doi:10.1007/BF02665038

Recent studies of thin films and surfaces by high-Resolution electron microscopy

David Smith, Rob W. Glaisher, Z. G. Li, Ping Lu, Martha McCartney, S. C Y Tsen, A. K. Datye

Research output: Contribution to journal › Article › peer-review

Abstract

The technique of high-resolution electron microscopy represents a powerful method for characterizing the microstructure of thin films and surfaces. We demonstrate its usefulness by reference to some recent studies of metals, semiconductors, and oxides, in particular, showing that it can be used to follow physical and chemical changes induced in situ by the electron beam or ex situ as a result of annealing or chemical treatment.

Original language	English (US)
Pages (from-to)	1063-1070
Number of pages	8
Journal	Metallurgical Transactions A
Volume	23
Issue number	4
DOIs	https://doi.org/10.1007/BF02665038
State	Published - Apr 1992

ASJC Scopus subject areas

Engineering(all)

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10.1007/BF02665038

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abstract = "The technique of high-resolution electron microscopy represents a powerful method for characterizing the microstructure of thin films and surfaces. We demonstrate its usefulness by reference to some recent studies of metals, semiconductors, and oxides, in particular, showing that it can be used to follow physical and chemical changes induced in situ by the electron beam or ex situ as a result of annealing or chemical treatment.",

author = "David Smith and Glaisher, {Rob W.} and Li, {Z. G.} and Ping Lu and Martha McCartney and Tsen, {S. C Y} and Datye, {A. K.}",

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AU - Glaisher, Rob W.

AU - Li, Z. G.

AU - Lu, Ping

AU - McCartney, Martha

AU - Tsen, S. C Y

AU - Datye, A. K.

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AB - The technique of high-resolution electron microscopy represents a powerful method for characterizing the microstructure of thin films and surfaces. We demonstrate its usefulness by reference to some recent studies of metals, semiconductors, and oxides, in particular, showing that it can be used to follow physical and chemical changes induced in situ by the electron beam or ex situ as a result of annealing or chemical treatment.

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Recent studies of thin films and surfaces by high-Resolution electron microscopy

Abstract

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