RandD of diamond films in the Frontier Carbon Technology Project and related topics

Koji Kobashi; Yoshiki Nishibayashi; Yoshihiro Yokota; Yutaka Ando; Takeshi Tachibana; Nobuyuki Kawakami; Kazushi Hayashi; Kenichi Inoue; Kiichi Meguro; Hiroshi Imai; Hiroshi Furuta; Takashi Hirao; Kenjiro Oura; Yasuhito Gotoh; Hironori Nakahara; Hiroshi Tsuji; Junzo Ishikawa; Franz A. Koeck; Robert J. Nemanich; Tadashi Sakai; Naoshi Sakuma; Hiroaki Yoshida

doi:10.1016/S0925-9635(02)00298-4

RandD of diamond films in the Frontier Carbon Technology Project and related topics

Koji Kobashi, Yoshiki Nishibayashi, Yoshihiro Yokota, Yutaka Ando, Takeshi Tachibana, Nobuyuki Kawakami, Kazushi Hayashi, Kenichi Inoue, Kiichi Meguro, Hiroshi Imai, Hiroshi Furuta, Takashi Hirao, Kenjiro Oura, Yasuhito Gotoh, Hironori Nakahara, Hiroshi Tsuji, Junzo Ishikawa, Franz A. Koeck, Robert J. Nemanich, Tadashi SakaiNaoshi Sakuma, Hiroaki Yoshida

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

R&D activities on diamond chemical vapor deposition (CVD) and field emission in the Frontier Carbon Technology Project are presented. The topics are (1) morphology control of diamond films grown by a 60-kW, 915-MHz microwave plasma CVD reactor, (2) growth technology of large single crystal diamond with a low density of defects, (3) heteroepitaxial growth technology of diamond films on Pt, (4) fabrication of sharp emitter tips on single crystal diamond, (5) field emission study from diamond particles, and (6) intense field emission from ion implanted homoepitaxial diamond layer. Research results of field emission obtained by Kyoto University and North Carolina State University are also described.

Original language	English (US)
Pages (from-to)	233-240
Number of pages	8
Journal	Diamond and Related Materials
Volume	12
Issue number	3-7
DOIs	https://doi.org/10.1016/S0925-9635(02)00298-4
State	Published - 2003
Externally published	Yes

Keywords

Chemical vapor deposition
Diamond films
Etching
Field emission

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Chemistry(all)
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/S0925-9635(02)00298-4

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Kobashi, K., Nishibayashi, Y., Yokota, Y., Ando, Y., Tachibana, T., Kawakami, N., Hayashi, K., Inoue, K., Meguro, K., Imai, H., Furuta, H., Hirao, T., Oura, K., Gotoh, Y., Nakahara, H., Tsuji, H., Ishikawa, J., Koeck, F. A., Nemanich, R. J., ... Yoshida, H. (2003). RandD of diamond films in the Frontier Carbon Technology Project and related topics. Diamond and Related Materials, 12(3-7), 233-240. https://doi.org/10.1016/S0925-9635(02)00298-4

Kobashi, K, Nishibayashi, Y, Yokota, Y, Ando, Y, Tachibana, T, Kawakami, N, Hayashi, K, Inoue, K, Meguro, K, Imai, H, Furuta, H, Hirao, T, Oura, K, Gotoh, Y, Nakahara, H, Tsuji, H, Ishikawa, J, Koeck, FA, Nemanich, RJ, Sakai, T, Sakuma, N & Yoshida, H 2003, 'RandD of diamond films in the Frontier Carbon Technology Project and related topics', Diamond and Related Materials, vol. 12, no. 3-7, pp. 233-240. https://doi.org/10.1016/S0925-9635(02)00298-4

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title = "RandD of diamond films in the Frontier Carbon Technology Project and related topics",

abstract = "R&D activities on diamond chemical vapor deposition (CVD) and field emission in the Frontier Carbon Technology Project are presented. The topics are (1) morphology control of diamond films grown by a 60-kW, 915-MHz microwave plasma CVD reactor, (2) growth technology of large single crystal diamond with a low density of defects, (3) heteroepitaxial growth technology of diamond films on Pt, (4) fabrication of sharp emitter tips on single crystal diamond, (5) field emission study from diamond particles, and (6) intense field emission from ion implanted homoepitaxial diamond layer. Research results of field emission obtained by Kyoto University and North Carolina State University are also described.",

keywords = "Chemical vapor deposition, Diamond films, Etching, Field emission",

author = "Koji Kobashi and Yoshiki Nishibayashi and Yoshihiro Yokota and Yutaka Ando and Takeshi Tachibana and Nobuyuki Kawakami and Kazushi Hayashi and Kenichi Inoue and Kiichi Meguro and Hiroshi Imai and Hiroshi Furuta and Takashi Hirao and Kenjiro Oura and Yasuhito Gotoh and Hironori Nakahara and Hiroshi Tsuji and Junzo Ishikawa and Koeck, {Franz A.} and Nemanich, {Robert J.} and Tadashi Sakai and Naoshi Sakuma and Hiroaki Yoshida",

note = "Funding Information: Our activities have been strongly supported by Prof. M. Yoshikawa, Dr H. Okushi, Prof. H. Kawarada, Dr S. Fujiwara, and Dr Y. Koga as well as FCT staff members. We would like to thank all of them for continuous encouragement. This work was supported by Japan Fine Ceramics Center (JFCC) that was consigned by New Energy and Industrial Technology Development Organization (NEDO). ",

year = "2003",

doi = "10.1016/S0925-9635(02)00298-4",

language = "English (US)",

volume = "12",

pages = "233--240",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier BV",

number = "3-7",

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TY - JOUR

T1 - RandD of diamond films in the Frontier Carbon Technology Project and related topics

AU - Kobashi, Koji

AU - Nishibayashi, Yoshiki

AU - Yokota, Yoshihiro

AU - Ando, Yutaka

AU - Tachibana, Takeshi

AU - Kawakami, Nobuyuki

AU - Hayashi, Kazushi

AU - Inoue, Kenichi

AU - Meguro, Kiichi

AU - Imai, Hiroshi

AU - Furuta, Hiroshi

AU - Hirao, Takashi

AU - Oura, Kenjiro

AU - Gotoh, Yasuhito

AU - Nakahara, Hironori

AU - Tsuji, Hiroshi

AU - Ishikawa, Junzo

AU - Koeck, Franz A.

AU - Nemanich, Robert J.

AU - Sakai, Tadashi

AU - Sakuma, Naoshi

AU - Yoshida, Hiroaki

N1 - Funding Information: Our activities have been strongly supported by Prof. M. Yoshikawa, Dr H. Okushi, Prof. H. Kawarada, Dr S. Fujiwara, and Dr Y. Koga as well as FCT staff members. We would like to thank all of them for continuous encouragement. This work was supported by Japan Fine Ceramics Center (JFCC) that was consigned by New Energy and Industrial Technology Development Organization (NEDO).

PY - 2003

Y1 - 2003

N2 - R&D activities on diamond chemical vapor deposition (CVD) and field emission in the Frontier Carbon Technology Project are presented. The topics are (1) morphology control of diamond films grown by a 60-kW, 915-MHz microwave plasma CVD reactor, (2) growth technology of large single crystal diamond with a low density of defects, (3) heteroepitaxial growth technology of diamond films on Pt, (4) fabrication of sharp emitter tips on single crystal diamond, (5) field emission study from diamond particles, and (6) intense field emission from ion implanted homoepitaxial diamond layer. Research results of field emission obtained by Kyoto University and North Carolina State University are also described.

AB - R&D activities on diamond chemical vapor deposition (CVD) and field emission in the Frontier Carbon Technology Project are presented. The topics are (1) morphology control of diamond films grown by a 60-kW, 915-MHz microwave plasma CVD reactor, (2) growth technology of large single crystal diamond with a low density of defects, (3) heteroepitaxial growth technology of diamond films on Pt, (4) fabrication of sharp emitter tips on single crystal diamond, (5) field emission study from diamond particles, and (6) intense field emission from ion implanted homoepitaxial diamond layer. Research results of field emission obtained by Kyoto University and North Carolina State University are also described.

KW - Chemical vapor deposition

KW - Diamond films

KW - Etching

KW - Field emission

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VL - 12

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EP - 240

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 3-7

ER -

RandD of diamond films in the Frontier Carbon Technology Project and related topics

Abstract

Keywords

ASJC Scopus subject areas

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