Abstract
A new approach to quantitative analysis of major element levels by secondary ion mass spectrometry is reported. A minor isotope of the element of interest is implanted directly into the analytical sample to be utilized as a standard. This approach has been used for analysis of hydrogen in amorphous silicon. The hydrogen content determined by reference to the implanted deuterium standard was compared to a nuclear reaction analysis of the same sample; the results agreed within the combined uncertainties of the measurements (10%). Isotope fractionation in the ion ejection process was determined by analysis of a silicon sample implanted with the species HD+.
Original language | English (US) |
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Pages (from-to) | 299-302 |
Number of pages | 4 |
Journal | Nuclear Instruments and Methods In Physics Research |
Volume | 218 |
Issue number | 1-3 |
DOIs | |
State | Published - Dec 15 1983 |
ASJC Scopus subject areas
- General Engineering