TY - GEN
T1 - Novel full-band monte carlo device simulator with real-space treatment of the short-range coulomb interactions for modeling 4H-SiC power devices
AU - Cheng, Chi Yin
AU - Vasileska, Dragica
N1 - Publisher Copyright:
© 2020 The Japan Society of Applied Physics.
Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/9/23
Y1 - 2020/9/23
N2 - In this work, we present a novel full-band Monte Carlo device simulator for modelling 4H-SiC Power electronic devices in which, for the first time, we use real-space molecular dynamics approach for the Coulomb interactions. Proper treatment of the electron-electron interactions is critical for modelling power electronic devices because of the high electron densities. In addition, because of the high applied voltages, the use of a full-band Monte Carlo device simulator is a must. The simulator has been successfully used to explain the steady-state behavior of a 3-D vertical double-diffused MOSFET (VDMOS) fabricated in the 4H-SiC technology.
AB - In this work, we present a novel full-band Monte Carlo device simulator for modelling 4H-SiC Power electronic devices in which, for the first time, we use real-space molecular dynamics approach for the Coulomb interactions. Proper treatment of the electron-electron interactions is critical for modelling power electronic devices because of the high electron densities. In addition, because of the high applied voltages, the use of a full-band Monte Carlo device simulator is a must. The simulator has been successfully used to explain the steady-state behavior of a 3-D vertical double-diffused MOSFET (VDMOS) fabricated in the 4H-SiC technology.
KW - 4H-SiC
KW - Full-band device simulator
KW - Monte Carlo Method
KW - Real-space treatment of Coulomb interactions
KW - Vertical double-diffused MOSFET (VDMOS)
UR - http://www.scopus.com/inward/record.url?scp=85096244406&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85096244406&partnerID=8YFLogxK
U2 - 10.23919/SISPAD49475.2020.9241605
DO - 10.23919/SISPAD49475.2020.9241605
M3 - Conference contribution
AN - SCOPUS:85096244406
T3 - International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
SP - 149
EP - 152
BT - 2020 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2020
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2020 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2020
Y2 - 3 September 2020 through 6 October 2020
ER -