Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

Winston Chern; Keng Hsu; Ik Su Chun; Bruno P.D. Azeredo; Numair Ahmed; Kyou Hyun Kim; Jian Min Zuo; Nick Fang; Placid Ferreira; Xiuling Li

doi:10.1021/nl903841a

Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

Winston Chern, Keng Hsu, Ik Su Chun, Bruno P.D. Azeredo, Numair Ahmed, Kyou Hyun Kim, Jian Min Zuo, Nick Fang, Placid Ferreira, Xiuling Li

Research output: Contribution to journal › Article › peer-review

209 Scopus citations

Abstract

Semiconductor nanowires have potential applications in photovoltaics, batteries, and thermoelectrics. We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. Strong light emission in the entire visible and near infrared wavelength range at room temperature, tunable by etching condition, attributed to surface features, and enhanced by silver surface plasmon, is demonstrated.

Original language	English (US)
Pages (from-to)	1582-1588
Number of pages	7
Journal	Nano Letters
Volume	10
Issue number	5
DOIs	https://doi.org/10.1021/nl903841a
State	Published - May 12 2010
Externally published	Yes

Keywords

Light-emitting
Metal-assisted-chemical-etching (MacEtch)
S4
Sidewall roughness
Silicon nanowire

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl903841a

Cite this

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abstract = "Semiconductor nanowires have potential applications in photovoltaics, batteries, and thermoelectrics. We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. Strong light emission in the entire visible and near infrared wavelength range at room temperature, tunable by etching condition, attributed to surface features, and enhanced by silver surface plasmon, is demonstrated.",

keywords = "Light-emitting, Metal-assisted-chemical-etching (MacEtch), S4, Sidewall roughness, Silicon nanowire",

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doi = "10.1021/nl903841a",

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T1 - Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

AU - Chern, Winston

AU - Hsu, Keng

AU - Chun, Ik Su

AU - Azeredo, Bruno P.D.

AU - Ahmed, Numair

AU - Kim, Kyou Hyun

AU - Zuo, Jian Min

AU - Fang, Nick

AU - Ferreira, Placid

AU - Li, Xiuling

PY - 2010/5/12

Y1 - 2010/5/12

N2 - Semiconductor nanowires have potential applications in photovoltaics, batteries, and thermoelectrics. We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. Strong light emission in the entire visible and near infrared wavelength range at room temperature, tunable by etching condition, attributed to surface features, and enhanced by silver surface plasmon, is demonstrated.

AB - Semiconductor nanowires have potential applications in photovoltaics, batteries, and thermoelectrics. We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. Strong light emission in the entire visible and near infrared wavelength range at room temperature, tunable by etching condition, attributed to surface features, and enhanced by silver surface plasmon, is demonstrated.

KW - Light-emitting

KW - Metal-assisted-chemical-etching (MacEtch)

KW - S4

KW - Sidewall roughness

KW - Silicon nanowire

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Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays

Abstract

Keywords

ASJC Scopus subject areas

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