@inproceedings{3c3ee2409e4f48d2967ea1b5c8da3838,
title = "Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays",
abstract = "We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.",
author = "W. Chern and K. Hsu and I. Chun and B. Azeredo and N. Fang and P. Ferreira and X. Li",
year = "2010",
doi = "10.1364/cleo.2010.cthv6",
language = "English (US)",
isbn = "9781557528896",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America (OSA)",
booktitle = "Conference on Lasers and Electro-Optics, CLEO 2010",
note = "Conference on Lasers and Electro-Optics, CLEO 2010 ; Conference date: 16-05-2010 Through 21-05-2010",
}