Negative electron affinity effects on H plasma exposed diamond (100) surfaces

P. K. Baumann, R. J. Nemanich

Research output: Contribution to journalArticlepeer-review

42 Scopus citations


The effects of annealing and a H plasma exposure on natural type IIb diamond (100) were investigated by means of ultraviolet photoemission spectroscopy (UPS). The diamond (100) surface was found to exhibit a negative electron affinity (NEA) following a 900 °C anneal in ultrahigh vacuum. After a H plasma exposure the NEA peak in the UPS spectra had doubled in height. An anneal to 1100 °C resulted in the removal of the sharp NEA feature. A second H plasma treatment resulted in the reappearance of the NEA peak like after the first H plasma exposure. A 2 × 1 reconstructed low-energy electron diffraction (LEED) pattern was observed subsequent to the anneals as well as the H plasma treatments. The fact that a NEA can be induced or removed repeatedly by means of a H plasma exposure or a 1100 °C anneal respectively provides evidence to correlate the appearance of a NEA with the presence of a monohydride terminated surface.

Original languageEnglish (US)
Pages (from-to)802-805
Number of pages4
JournalDiamond and Related Materials
Issue number5-6
StatePublished - May 1 1995
Externally publishedYes


  • Diamond
  • Hydrogen
  • Substrate preparation
  • Surface characterization

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • General Chemistry
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering


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