TY - JOUR
T1 - Nanoscale memory elements based on solid-state electrolytes
AU - Kozicki, Michael
AU - Park, Mira
AU - Mitkova, Maria
N1 - Funding Information:
Manuscript received June 17, 2004; revised December 1, 2004. This work was supported by the Axon Technologies Corporation. The authors are with the Center for Solid-State Electronics Research, Arizona State University, Tempe, AZ 85287-6206 USA (e-mail: [email protected]). Digital Object Identifier 10.1109/TNANO.2005.846936 1The latest version of the International Technology Roadmap for semiconductors is available online. [Online]. Available: http://public.itrs.net
PY - 2005/5
Y1 - 2005/5
N2 - We report on the fabrication and characterization of nanoscale memory elements based on solid electrolytes. When combined with silver, chalcogenide glasses such as Se-rich Ge-Se are good solid electrolytes, exhibiting high Ag ion mobility and availability. By placing an anode that has oxidizable Ag and an inert cathode (e.g., Ni) in contact with a thin layer of such a material, a device is formed that has an intrinsically high resistance, but which can be switched to a low-resistance state at small voltage via reduction of the silver ions. An opposite bias will return the device to a high-resistance state, and this reversible switching effect is the basis of programmable metallization cell technology. In this paper, electron beam lithography was used to make sub-100-nm openings in polymethylmethacrylate layers used as the dielectric between the device electrodes. The solid electrolyte film was formed in these via-holes so that their small diameter defined the active switching area between the electrodes. The Ag-Ge-Se electrolyte was created by the photodiffusion, with or without thermal assistance, of an Ag layer into the Ge-Se base glass. Combined thermal and photodiffusion leads to a nanophase separated material with a dispersed Ag ion-rich material with an average crystallite size of 7.5 nm in a glassy insulating Ge-rich continuous phase. The nanoscale devices write at an applied bias as low as 0.2 V, erase by -0.5 V, and fall from over 107 Ω to a low-resistance state (e.g., 104 Ω for a 10-μA programming current) in less than 100 ns. Cycling appears excellent with projected endurance well beyond 1011 cycles.
AB - We report on the fabrication and characterization of nanoscale memory elements based on solid electrolytes. When combined with silver, chalcogenide glasses such as Se-rich Ge-Se are good solid electrolytes, exhibiting high Ag ion mobility and availability. By placing an anode that has oxidizable Ag and an inert cathode (e.g., Ni) in contact with a thin layer of such a material, a device is formed that has an intrinsically high resistance, but which can be switched to a low-resistance state at small voltage via reduction of the silver ions. An opposite bias will return the device to a high-resistance state, and this reversible switching effect is the basis of programmable metallization cell technology. In this paper, electron beam lithography was used to make sub-100-nm openings in polymethylmethacrylate layers used as the dielectric between the device electrodes. The solid electrolyte film was formed in these via-holes so that their small diameter defined the active switching area between the electrodes. The Ag-Ge-Se electrolyte was created by the photodiffusion, with or without thermal assistance, of an Ag layer into the Ge-Se base glass. Combined thermal and photodiffusion leads to a nanophase separated material with a dispersed Ag ion-rich material with an average crystallite size of 7.5 nm in a glassy insulating Ge-rich continuous phase. The nanoscale devices write at an applied bias as low as 0.2 V, erase by -0.5 V, and fall from over 107 Ω to a low-resistance state (e.g., 104 Ω for a 10-μA programming current) in less than 100 ns. Cycling appears excellent with projected endurance well beyond 1011 cycles.
KW - Electrical switching
KW - Nanoscale devices
KW - Nanostructured materials
KW - Nonvolatile memory
KW - Solid-state electrolytes
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U2 - 10.1109/TNANO.2005.846936
DO - 10.1109/TNANO.2005.846936
M3 - Article
AN - SCOPUS:20444372632
SN - 1536-125X
VL - 4
SP - 331
EP - 338
JO - IEEE Transactions on Nanotechnology
JF - IEEE Transactions on Nanotechnology
IS - 3
ER -