Abstract
Nanolithography is the technology of fabricating sub-0.1 μm structures for use in either electronic devices or novel experiments in physics. While this has predominantly been the province of electron-beam lithography, new approaches explore the use of scanning probe techniques. Here, we discuss the limitations of electron-beam lithography, the development of novel SiO2 resists, and some uses of scanning-probe lithography.
Original language | English (US) |
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Pages (from-to) | 1552-1557 |
Number of pages | 6 |
Journal | Semiconductor Science and Technology |
Volume | 11 |
Issue number | 11 SUPPL. S |
DOIs | |
State | Published - Nov 1996 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry