Molecular control of the threshold voltage of an NMOS inversion layer

Jinman Yang, Trevor Thornton, Michael Kozicki, L. De la Garza, D. Gust

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


We have developed a hybrid molecular-MOSFET structure that is sensitive to the presence of a molecular monolayer attached to its surface. The device is fabricated from a silicon-on-insulator wafer and we use a substrate voltage, Vsub, to invert the buried Si:SiO2 interface. This allows the top surface of the silicon to be free of any insulating layers, apart from a thin native oxide that forms on exposure to air. The buried inversion layer is only a few hundred angstroms away from the exposed surface, and the threshold voltage of the device, Vth, is strongly influenced by the surface potential. A spiropyran monolayer is attached to the surface of the device by means of carboxylic-SiO2 bonding. After attachment of the monolayer, the threshold voltage of the device shifts to more negative values. We explain this result in terms of an increase in the concentration of fixed positive charge at the upper Si:SiO2 interface due to protonation of the surface by the molecular monolayer.

Original languageEnglish (US)
Pages (from-to)135-139
Number of pages5
JournalMicroelectronic Engineering
Issue number1-3
StatePublished - Aug 2002


  • Electron transport
  • Molecular electronics
  • SOI

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


Dive into the research topics of 'Molecular control of the threshold voltage of an NMOS inversion layer'. Together they form a unique fingerprint.

Cite this