Magnetic and structural properties of high rate dual ion-beam sputtered NiFe films (invited)

Jerry Lo, C. Hwang, T. C. Huang, R. Campbell, David Allee

Research output: Contribution to journalArticlepeer-review

19 Scopus citations


NiFe films in the thickness range of 300 Å to 8 μm with excellent magnetic properties and thickness uniformity have been prepared using a newly developed high rate (up to 1000 Å/min) dual ion beam sputtering system. Deposition conditions such as the ion assist voltage, the target orientation and the partial pressure of nitrogen have been optimized to reduce coercivity Hc and stress as well as to improve film adhesion and film thermal stability. The annealing effects on Hc, the anisotropy field H k, as well as the resistivity of the NiFe films were studied. X-ray diffraction and transmission electron microscopy techniques were used to characterize the microstructures of the films and were correlated with their magnetic properties. These ion-beam sputtered NiFe films have excellent magnetic, electrical, mechanical, and microstructural properties to make them suitable for thin-film head applications.

Original languageEnglish (US)
Pages (from-to)3520-3525
Number of pages6
JournalJournal of Applied Physics
Issue number8
StatePublished - 1987
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)


Dive into the research topics of 'Magnetic and structural properties of high rate dual ion-beam sputtered NiFe films (invited)'. Together they form a unique fingerprint.

Cite this