Low temperature chemical vapor deposition of Si-based compounds via SiH 3SiH 2SiH 3: Metastable SiSn/GeSn/Si(100) heteroepitaxial structures

J. Tolle, Andrew Chizmeshya, Y. Y. Fang, John Kouvetakis, V. R. D'Costa, C. W. Hu, Jose Menendez, I. S T Tsong

Research output: Contribution to journal › Article › peer-review

88 Scopus citations

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Physics & Astronomy