Low resistivity yttrium-doped zinc oxide by electrochemical deposition

Xiaofei Han, Kunhee Han, Meng Tao

Research output: Contribution to journalArticlepeer-review

25 Scopus citations


Low resistivity zinc oxide films are electrochemically deposited on indium tin oxide (ITO) coated glass substrates from an aqueous solution with an abundant and low cost dopant, yttrium. After postdeposition annealing in nitrogen at 300°C, the resistivity of Y-doped ZnO is reduced to as low as 6.3× 10-5 ωcm. X-ray diffraction reveals no intermixing of ZnO with ITO, suggesting little effect from the ITO film under ZnO. UV/visible spectroscopy indicates high transmittance (80%) and low absorbance (5-10%) for Y-doped ZnO. These results demonstrate that solution-prepared ZnO excels in cost and performance over vacuum-prepared ZnO as a transparent conducting oxide for large-scale devices such as solar cells and flat-panel displays.

Original languageEnglish (US)
Pages (from-to)H593-H597
JournalJournal of the Electrochemical Society
Issue number6
StatePublished - Nov 1 2010
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry


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