Large-Area Deposition of MoS2 by Pulsed Laser Deposition with in Situ Thickness Control

Martha I. Serna, Seong H. Yoo, Salvador Moreno, Yang Xi, Juan Pablo Oviedo, Hyunjoo Choi, Husam N. Alshareef, Moon J. Kim, Majid Minary-Jolandan, Manuel A. Quevedo-Lopez

Research output: Contribution to journalArticlepeer-review

196 Scopus citations


A scalable and catalyst-free method to deposit stoichiometric molybdenum disulfide (MoS2) films over large areas is reported, with the maximum area limited by the size of the substrate holder. The method allows deposition of MoS2 layers on a wide range of substrates without any additional surface preparation, including single-crystal (sapphire and quartz), polycrystalline (HfO2), and amorphous (SiO2) substrates. The films are deposited using carefully designed MoS2 targets fabricated with excess sulfur and variable MoS2 and sulfur particle size. Uniform and layered MoS2 films as thin as two monolayers, with an electrical resistivity of 1.54 × 104 ω cm-1, were achieved. The MoS2 stoichiometry was confirmed by high-resolution Rutherford backscattering spectrometry. With the method reported here, in situ graded MoS2 films ranging from ∼1 to 10 monolayers can be deposited.

Original languageEnglish (US)
Pages (from-to)6054-6061
Number of pages8
JournalACS nano
Issue number6
StatePublished - Jun 28 2016
Externally publishedYes


  • 2D materials
  • MoS
  • PLD
  • electrical properties
  • engineered target
  • layered materials
  • pulsed laser deposition

ASJC Scopus subject areas

  • General Materials Science
  • General Engineering
  • General Physics and Astronomy


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