Intrinsic limitations on ultimate device performance and reliability at (i) semiconductor-dielectric interfaces and (ii) internal interfaces in stacked dielectrics

Engineering & Materials Science

• Semiconductor materials 100%
• Oxides 69%
• Dielectric films 47%
• Plasmas 29%
• Constraint theory 27%
• High-k dielectric 25%
• Defects 22%
• Monolayers 21%
• Field effect transistors 17%
• Atoms 16%
• Silica 16%
• Permittivity 16%
• Silicon 12%
• Substrates 11%
• Experiments 5%

Physics & Astronomy

• performance 49%
• oxides 35%
• defects 12%
• field effect transistors 8%
• silicon dioxide 8%
• scaling 7%
• permittivity 7%
• requirements 7%
• silicon 6%
• atoms 5%