IBA of ordered ultra-thin SiO2 grown on (1×1) Si(100)

Nicole Herberts, James Douglas Bradley, Robert Culbertson, Justin Shaw, Vasu Atluri

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Ion Beam Analysis (IBA) using 4He+ ion channeling combined with Nuclear Resonance Analysis (NRA) and 3DMultiString computer simulations detect order in silicon dioxide (SiO2) nucleated on (1×1) Si(100) via the Herbots-Atluri clean (U.S. patent 6,613,677) in air at 300 K. Alignment of the SiO2 to Si(100) is also supported by 10 keV Reflection High Energy Electron Diffraction (RHEED). Infrared spectroscopy of ordered oxides exhibit a constant, well-defined frequency of optical absorption across a 1 nm thickness in the interfacial region near Si, supporting the presence of a well defined bond-length and stoichiometry as detected by IBA and RHEED. In this work IBA is combined with 3DMultiString to identify a new heteroepitaxial nanophase of tetragonally distorted β-cristobalite SiO 2 (annotated β3-c SiO2) extending to a critical thickness of 2 nm from the (1×1) Si(100)/β-c SiO2 interface to the β-c SiO2/amorphous SiO2 interface (annotated β3-c SiO2/a-SiO2). 3DMultiString simulations of IBA data taken on the newly identifiedfi-c SiO 2/(1×1) Si(100) interphase includes channeling along the three <100>, <110>, and <111> axes of Si(100) in combination 160(α, α)160 3.045 MeV NRA to measure oxygen areal densities corresponding to nm-thick films. In this manner, the critical thickness of the new heteroepitaxial β-c SiO2 nanophase can be established as a function of oxygen coverage.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings - Characterization of Oxide/Semiconductor Interfaces for CMOS Technologies
Number of pages6
StatePublished - Dec 1 2007
EventCharacterization of Oxide/Semiconductor Interfaces for CMOS Technologies - 2007 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 9 2007Apr 13 2007

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


OtherCharacterization of Oxide/Semiconductor Interfaces for CMOS Technologies - 2007 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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