High resolution electron microscopy of surfaces and surface reactions

David Smith, J. O. Bovin, L. A. Bursill, A. K. Petford-Long, H. Q. Ye

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


A 400 kV high‐resolution electron microscope has been used in the surface profile imaging mode to observe surfaces and surface reactions directly in real time. The processes studied include: the formation of surface oxides on Pd and Ag and on In‐compound semiconductors; surface reduction and metallization, diffusion and accretion on oxide surfaces; and structural rearrangements in small metal particles. It is concluded that the technique can provide unique information about surface phenomena.

Original languageEnglish (US)
Pages (from-to)135-141
Number of pages7
JournalSurface and Interface Analysis
Issue number2-3
StatePublished - Mar 1987

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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