Abstract
Stoichiometric, highly ordered, and smooth ZnO surfaces were produced via exposure to a remote oxygen/He plasma. A 40-nm-thick Ti film was deposited by electron beam evaporation on the entire (0001) face of each ZnO piece. Atomic force microscopy studies revealed a rms surface roughness of 0.2±0.2nm before and after the plasma clean. The best contact behavior was found for plasma-cleaned surfaces that were subsequently cooled to room temperature in the unignited plasma gas and subsequently exposed to the plasma for 30 s.
Original language | English (US) |
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Pages (from-to) | 400-402 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 82 |
Issue number | 3 |
DOIs | |
State | Published - Jan 20 2003 |
Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)