TY - JOUR
T1 - Finite Element Simulation of Potential-Induced Degradation Kinetics in p-Type Silicon Solar Modules
AU - Martinez-Loran, Erick
AU - Von Gastrow, G.
AU - Clenney, Jacob
AU - Meier, Rico
AU - Bandaru, Prabhakar
AU - Bertoni, Mariana
AU - Fenning, David
N1 - Funding Information:
This work was supported by the U.S. Department of Energy's Office of Energy Efficiency and Renewable Energy under Solar Energy Technologies Office under Agreement DE-EE0007751.
Publisher Copyright:
© 2011-2012 IEEE.
PY - 2022/1/1
Y1 - 2022/1/1
N2 - We present a physics-based model to describe the kinetics of potential-induced degradation (PID) in p-Si photovoltaic (PV) modules, parametrized by the diffusivities of Na in the module stack, electric field in the SiNx, level of Na contamination, and segregation kinetics of Na in SiNx. Based on a sensitivity analysis on the expected electric field and levels of Na contamination at the surface of SiNx, we identify a relationship between the diffusivity of Na in the stacking faults present in the emitter and the kinetics of shunt resistance, R sh. These findings indicate a faster diffusion mechanism through the stacking faults than that which would be expected for bulk Si, for PID-prone p-Si modules. Our simulations imply that a decrease in the SiNx resistivity alone cannot explain robustness to PID-s, suggesting that a diffusivity dependence on the nitride chemistry may be responsible in part for PID-robust devices. We show that additional interface engineering could potentially reduce the ingress of Na and hence PID by allowing Na to segregate on interface layers.
AB - We present a physics-based model to describe the kinetics of potential-induced degradation (PID) in p-Si photovoltaic (PV) modules, parametrized by the diffusivities of Na in the module stack, electric field in the SiNx, level of Na contamination, and segregation kinetics of Na in SiNx. Based on a sensitivity analysis on the expected electric field and levels of Na contamination at the surface of SiNx, we identify a relationship between the diffusivity of Na in the stacking faults present in the emitter and the kinetics of shunt resistance, R sh. These findings indicate a faster diffusion mechanism through the stacking faults than that which would be expected for bulk Si, for PID-prone p-Si modules. Our simulations imply that a decrease in the SiNx resistivity alone cannot explain robustness to PID-s, suggesting that a diffusivity dependence on the nitride chemistry may be responsible in part for PID-robust devices. We show that additional interface engineering could potentially reduce the ingress of Na and hence PID by allowing Na to segregate on interface layers.
KW - Degradation kinetics
KW - Potential-induced degradation (PID)
KW - Reliability
KW - Silicon photovoltaic (PV)
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U2 - 10.1109/JPHOTOV.2021.3123870
DO - 10.1109/JPHOTOV.2021.3123870
M3 - Article
AN - SCOPUS:85120079977
SN - 2156-3381
VL - 12
SP - 45
EP - 52
JO - IEEE Journal of Photovoltaics
JF - IEEE Journal of Photovoltaics
IS - 1
ER -