Few-layer MoS2 as nitrogen protective barrier

B. Akbali, A. Yanilmaz, A. Tomak, S. Tongay, C. Celebi, H. Sahin

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


We report experimental and theoretical investigations of the observed barrier behavior of few-layer MoS2 against nitrogenation. Owing to its low-strength shearing, low friction coefficient, and high lubricity, MoS2 exhibits the demeanor of a natural N-resistant coating material. Raman spectroscopy is done to determine the coating capability of MoS2 on graphene. Surface morphology of our MoS2/graphene heterostructure is characterized by using optical microscopy, scanning electron microscopy, and atomic force microscopy. In addition, density functional theory-based calculations are performed to understand the energy barrier performance of MoS2 against nitrogenation. The penetration of nitrogen atoms through a defect-free MoS2 layer is prevented by a very high vertical diffusion barrier, indicating that MoS2 can serve as a protective layer for the nitrogenation of graphene. Our experimental and theoretical results show that MoS2 material can be used both as an efficient nanocoating material and as a nanoscale mask for selective nitrogenation of graphene layer.

Original languageEnglish (US)
Article number415706
Issue number41
StatePublished - Sep 13 2017


  • MoS2
  • chemical vapor deposition
  • coating performance
  • density functional theory
  • grapheme
  • liquid exfoliation
  • nitrogen doping

ASJC Scopus subject areas

  • Bioengineering
  • General Chemistry
  • General Materials Science
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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