Factory-wide run-to-run process control

Mark Yelverton, Konstantinos Tsakalis, Kevin Stoddard

Research output: Contribution to journalArticlepeer-review


Run-to-run process control is traditionally applied to select processes. Through advances in process-engineering-friendly software tools, this can be used across wafer fabrication to maintain process repeatability automatically and compensate for upstream process variability, achieve better device yields and speeds, and greatly enhance factory productivity.

Original languageEnglish (US)
JournalSolid State Technology
Issue number12
StatePublished - 1999
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics


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