Fabrication of highly spin-polarized Co2FeAl 0.5Si0.5 thin-films

M. Vahidi; J. A. Gifford; S. K. Zhang; S. Krishnamurthy; Z. G. Yu; L. Yu; M. Huang; C. Youngbull; Tingyong Chen; Nathan Newman

doi:10.1063/1.4869798

Fabrication of highly spin-polarized Co₂FeAl _0.5Si_0.5 thin-films

M. Vahidi, J. A. Gifford, S. K. Zhang, S. Krishnamurthy, Z. G. Yu, L. Yu, M. Huang, C. Youngbull, Tingyong Chen, Nathan Newman

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

Ferromagnetic Heusler Co₂FeAl_0.5Si_0.5 epitaxial thin-films have been fabricated in the L2₁ structure with saturation magnetizations over 1200 emu/cm³. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

Original language	English (US)
Article number	046108
Journal	APL Materials
Volume	2
Issue number	4
DOIs	https://doi.org/10.1063/1.4869798
State	Published - Apr 2014

ASJC Scopus subject areas

Materials Science(all)
Engineering(all)

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@article{ef817bdf9fbe4322881a7ef524114b9b,

title = "Fabrication of highly spin-polarized Co2FeAl 0.5Si0.5 thin-films",

abstract = "Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.",

author = "M. Vahidi and Gifford, {J. A.} and Zhang, {S. K.} and S. Krishnamurthy and Yu, {Z. G.} and L. Yu and M. Huang and C. Youngbull and Tingyong Chen and Nathan Newman",

year = "2014",

month = apr,

doi = "10.1063/1.4869798",

language = "English (US)",

volume = "2",

journal = "APL Materials",

issn = "2166-532X",

publisher = "American Institute of Physics Publising LLC",

number = "4",

}

TY - JOUR

T1 - Fabrication of highly spin-polarized Co2FeAl 0.5Si0.5 thin-films

AU - Vahidi, M.

AU - Gifford, J. A.

AU - Zhang, S. K.

AU - Krishnamurthy, S.

AU - Yu, Z. G.

AU - Yu, L.

AU - Huang, M.

AU - Youngbull, C.

AU - Chen, Tingyong

AU - Newman, Nathan

PY - 2014/4

Y1 - 2014/4

N2 - Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

AB - Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

UR - http://www.scopus.com/inward/record.url?scp=84900035879&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84900035879&partnerID=8YFLogxK

U2 - 10.1063/1.4869798

DO - 10.1063/1.4869798

M3 - Article

AN - SCOPUS:84900035879

SN - 2166-532X

VL - 2

JO - APL Materials

JF - APL Materials

IS - 4

M1 - 046108

ER -

Fabrication of highly spin-polarized Co₂FeAl _0.5Si_0.5 thin-films

Abstract

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