Electron diffraction in UHV SEM, REM, and TEM

J. A. Venables; C. J. Harland; Peter Bennett; T. E A Zerrouk

Electron diffraction in UHV SEM, REM, and TEM

J. A. Venables, C. J. Harland, Peter Bennett, T. E A Zerrouk

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Electron diffraction techniques are widely used in Surface Science, with the main aim of determining atomic positions in surface reconstruction and the location of absorbed atoms. These require an Ultra-high vacuum (UHV) environment. The use of a focussed beam in UHV electron microscopes in principle allows such techniques to be applied on a microscopic scale. Several reflection (REM) and scanning (SEM) instruments have been built with energies between 5 and 100 keV. In general, the addition of RHEED to an UHV-SEM with Auger Electron Spectroscopy (AES) forms a very useful tool in Surface Science.

Original language	English (US)
Title of host publication	Proceedings - Annual Meeting, Microscopy Society of America
Editors	G.W. Bailey, A.J. Garratt-Reed
Pages	594-595
Number of pages	2
State	Published - 1994
Externally published	Yes
Event	Proceedings of the 52nd Annual Meeting of the Microscopy Society of America - New Orleans, LA, USA Duration: Jul 31 1994 → Aug 5 1994

Other

Other	Proceedings of the 52nd Annual Meeting of the Microscopy Society of America
City	New Orleans, LA, USA
Period	7/31/94 → 8/5/94

ASJC Scopus subject areas

General Engineering

Cite this

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title = "Electron diffraction in UHV SEM, REM, and TEM",

abstract = "Electron diffraction techniques are widely used in Surface Science, with the main aim of determining atomic positions in surface reconstruction and the location of absorbed atoms. These require an Ultra-high vacuum (UHV) environment. The use of a focussed beam in UHV electron microscopes in principle allows such techniques to be applied on a microscopic scale. Several reflection (REM) and scanning (SEM) instruments have been built with energies between 5 and 100 keV. In general, the addition of RHEED to an UHV-SEM with Auger Electron Spectroscopy (AES) forms a very useful tool in Surface Science.",

author = "Venables, {J. A.} and Harland, {C. J.} and Peter Bennett and Zerrouk, {T. E A}",

year = "1994",

language = "English (US)",

pages = "594--595",

editor = "G.W. Bailey and A.J. Garratt-Reed",

booktitle = "Proceedings - Annual Meeting, Microscopy Society of America",

note = "Proceedings of the 52nd Annual Meeting of the Microscopy Society of America ; Conference date: 31-07-1994 Through 05-08-1994",

}

TY - GEN

T1 - Electron diffraction in UHV SEM, REM, and TEM

AU - Venables, J. A.

AU - Harland, C. J.

AU - Bennett, Peter

AU - Zerrouk, T. E A

PY - 1994

Y1 - 1994

N2 - Electron diffraction techniques are widely used in Surface Science, with the main aim of determining atomic positions in surface reconstruction and the location of absorbed atoms. These require an Ultra-high vacuum (UHV) environment. The use of a focussed beam in UHV electron microscopes in principle allows such techniques to be applied on a microscopic scale. Several reflection (REM) and scanning (SEM) instruments have been built with energies between 5 and 100 keV. In general, the addition of RHEED to an UHV-SEM with Auger Electron Spectroscopy (AES) forms a very useful tool in Surface Science.

AB - Electron diffraction techniques are widely used in Surface Science, with the main aim of determining atomic positions in surface reconstruction and the location of absorbed atoms. These require an Ultra-high vacuum (UHV) environment. The use of a focussed beam in UHV electron microscopes in principle allows such techniques to be applied on a microscopic scale. Several reflection (REM) and scanning (SEM) instruments have been built with energies between 5 and 100 keV. In general, the addition of RHEED to an UHV-SEM with Auger Electron Spectroscopy (AES) forms a very useful tool in Surface Science.

UR - http://www.scopus.com/inward/record.url?scp=0028746828&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028746828&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0028746828

SP - 594

EP - 595

BT - Proceedings - Annual Meeting, Microscopy Society of America

A2 - Bailey, G.W.

A2 - Garratt-Reed, A.J.

T2 - Proceedings of the 52nd Annual Meeting of the Microscopy Society of America

Y2 - 31 July 1994 through 5 August 1994

ER -

Electron diffraction in UHV SEM, REM, and TEM

Abstract

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ASJC Scopus subject areas

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