Tapping mode atomic force microscopy and capacitance versus voltage measurements were employed to study the effects of electron-beam exposure on self-assembled monolayers of 10-undecenoic acid. It was established that exposure increases chemical/mechanical stability, resulting in a thicker layer following a solvent treatment designed to remove residual monomers. Electron exposure also reduces the effects of pinholes in the monolayer, thereby improving dielectric quality.
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Electrical and Electronic Engineering