Abstract
Tapping mode atomic force microscopy and capacitance versus voltage measurements were employed to study the effects of electron-beam exposure on self-assembled monolayers of 10-undecenoic acid. It was established that exposure increases chemical/mechanical stability, resulting in a thicker layer following a solvent treatment designed to remove residual monomers. Electron exposure also reduces the effects of pinholes in the monolayer, thereby improving dielectric quality.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 481-484 |
| Number of pages | 4 |
| Journal | Superlattices and Microstructures |
| Volume | 27 |
| Issue number | 5 |
| DOIs | |
| State | Published - 2000 |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Electrical and Electronic Engineering