Electrodeposition of group-IIIA doped ZnO as a transparent conductive oxide

Xiaofei Han, Kunhee Han, Meng Tao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

13 Scopus citations


Electrodeposition of Group-IIIA (Al and Ga) doped ZnO with resistivity as low as 3.8×10-4 Ω-cm is reported here. This ZnO can be used as an "on-top" transparent conductive oxide which is deposited on semiconductors in thin-film solar cells such as amorphous Si, CIGS, and organic cells. In addition to low cost, high throughput, and large-area processing, electrodeposition provides advantages other solution-based deposition techniques do not offer, including precise and in-line control of the film thickness. After post-deposition annealing, Al-doped ZnO achieves a resistivity of 8×10-4 Ω-cm and Ga-doped ZnO 3.8×10-4 Ω-cm, respectively. The doping mechanism is believed to be coprecipitation of ZnO with Al2O3 or Ga2O3 in the aqueous solution, leading to Al or Ga substitution of Zn in the ZnO lattice as n-type dopant. Both Al-doped and Ga-doped ZnO shows high transmittance above 80% for films of ∼450 nm thick.

Original languageEnglish (US)
Title of host publicationPhotovoltaics for the 21st Century 5
PublisherElectrochemical Society Inc.
Number of pages10
ISBN (Electronic)9781566777827
ISBN (Print)9781566777827
StatePublished - 2009
Externally publishedYes

Publication series

NameECS Transactions
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

ASJC Scopus subject areas

  • Engineering(all)


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