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DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST
David Ferry (Inventor)
Arizona State University
Research output
:
Patent
Overview
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Physics & Astronomy
photographic developers
100%
patents
33%
inventions
33%
electrons
32%
photoresists
26%
polymethyl methacrylate
26%
low concentrations
24%
integrated circuits
24%
fabrication
15%
performance
11%