Comparison of AlF₃thin films grown by thermal and plasma enhanced atomic layer deposition

Engineering & Materials Science

• Atomic layer deposition 100%
• Plasmas 60%
• Photoelectron spectroscopy 47%
• Ellipsometry 47%
• Hot Temperature 31%
• X rays 25%
• Hydrogen 22%
• Inductively coupled plasma 13%
• Impurities 8%
• Aluminum 7%
• Carbon 7%
• Substrates 6%
• Chemical analysis 6%
• Temperature 3%

Chemical Compounds

• Atomic Layer Epitaxy 75%
• Plasma 40%
• Liquid Film 31%
• Ellipsometry 30%
• Photoelectron Spectroscopy 27%
• Molecular Cluster 18%
• Hydrogen Fluoride 11%
• Deposition Process 10%
• Inductively Coupled Plasma 9%
• Fluoride 7%
• Hydrogen 4%
• Carbon Atom 4%

Physics & Astronomy

• atomic layer epitaxy 67%
• x ray spectroscopy 28%
• ellipsometry 27%
• photoelectron spectroscopy 23%
• aluminum fluorides 15%
• hydrofluoric acid 11%
• hydrogen plasma 10%
• cycles 6%
• carbon 6%
• impurities 6%
• temperature 2%