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Comparative fluctuation microscopy study of medium-range order in hydrogenated amorphous silicon deposited by various methods
P. M. Voyles
,
Michael Treacy
, H. C. Jin
, J. R. Abelson
, J. M. Gibson
, J. Yang
, S. Guha
, R. S. Crandall
Research output
:
Chapter in Book/Report/Conference proceeding
›
Conference contribution
12
Scopus citations
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Keyphrases
Microscopic Study
100%
Medium-range Order
100%
Fluctuation Microscopy
100%
Hydrogenated Amorphous Silicon
100%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
75%
Amorphous Matrix
50%
Deposition Methods
25%
Si Crystal
25%
Light-induced Degradation
25%
Fluctuation Electron Microscopy
25%
Small Variation
25%
Precursor Gases
25%
H Content
25%
Paracrystalline
25%
Crystal Grain
25%
Hydrogenated Amorphous Silicon Thin Film
25%
Hot Filament Chemical Vapor Deposition (HFCVD)
25%
Reactive Magnetron Sputtering
25%
Material Science
Film
100%
Amorphous Silicon
100%
Medium-Range Order
100%
Dilution
75%
Density
25%
Thin Films
25%
Electron Microscopy
25%
Chemical Vapor Deposition
25%
Plasma-Enhanced Chemical Vapor Deposition
25%
Magnetron Sputtering
25%