Chemical vapor deposition of diamond films from water vapor rf-plasma discharges

R. A. Rudder, G. C. Hudson, J. B. Posthill, R. E. Thomas, R. C. Hendry, D. P. Malta, R. J. Markunas, T. P. Humphreys, R. J. Nemanich

Research output: Contribution to journal › Article › peer-review