Application of the MOS charge-sheet model to nonuniform doping along the channel

James Victory, Julian Sanchez, Thomas DeMassa, Bruno Welfert

Research output: Contribution to journalArticlepeer-review

10 Scopus citations


Nonuniform doping along the channel direction has played a central role in the power MOS device field. In addition, a new class of submicron devices using nonuniformly doped channels have exhibited remarkable resistance to short channel effects. Modeling of these devices for CAD applications has been limited to empirical models which assume uniform doping. The substrate doping concentration directly affects the electrostatics in the channel region and any variation in its value has significant effects on the device parameters. This paper presents a generalized version of the MOS charge-sheet model which physically incorporates nonuniform doping along the channel into the analysis. The model is developed and verified using the two dimensional device simulator PISCES on nonuniformly doped MOSFETs.

Original languageEnglish (US)
Pages (from-to)1497-1503
Number of pages7
JournalSolid State Electronics
Issue number8
StatePublished - Aug 1995

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry


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