A low energy electron beam annealing system: Design, capability and use

M. N. Kozicki; A. R. Dinnis; J. M. Robertson

doi:10.1002/sca.4950060201

A low energy electron beam annealing system: Design, capability and use

M. N. Kozicki, A. R. Dinnis, J. M. Robertson

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The paper discusses how an experimental low energy electron‐beam annealing system may be constructed from SEM components for use in semiconductor research. The system is essentially very simple in design but is adequate for selective transient annealing of areas of bulk materials and features within specially fabricated test integrated circuits. Some experimental results obtained with such a system are detailed to illustrate its use and capabilities.

Original language	English (US)
Pages (from-to)	3-7
Number of pages	5
Journal	Scanning
Volume	6
Issue number	2
DOIs	https://doi.org/10.1002/sca.4950060201
State	Published - 1984
Externally published	Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Instrumentation

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10.1002/sca.4950060201

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@article{c11b3edc9f5f45fcbb2ed20d569c7d75,

title = "A low energy electron beam annealing system: Design, capability and use",

abstract = "The paper discusses how an experimental low energy electron‐beam annealing system may be constructed from SEM components for use in semiconductor research. The system is essentially very simple in design but is adequate for selective transient annealing of areas of bulk materials and features within specially fabricated test integrated circuits. Some experimental results obtained with such a system are detailed to illustrate its use and capabilities.",

author = "Kozicki, {M. N.} and Dinnis, {A. R.} and Robertson, {J. M.}",

year = "1984",

doi = "10.1002/sca.4950060201",

language = "English (US)",

volume = "6",

pages = "3--7",

journal = "Scanning",

issn = "0161-0457",

publisher = "John Wiley and Sons Inc.",

number = "2",

}

TY - JOUR

T1 - A low energy electron beam annealing system

T2 - Design, capability and use

AU - Kozicki, M. N.

AU - Dinnis, A. R.

AU - Robertson, J. M.

PY - 1984

Y1 - 1984

N2 - The paper discusses how an experimental low energy electron‐beam annealing system may be constructed from SEM components for use in semiconductor research. The system is essentially very simple in design but is adequate for selective transient annealing of areas of bulk materials and features within specially fabricated test integrated circuits. Some experimental results obtained with such a system are detailed to illustrate its use and capabilities.

AB - The paper discusses how an experimental low energy electron‐beam annealing system may be constructed from SEM components for use in semiconductor research. The system is essentially very simple in design but is adequate for selective transient annealing of areas of bulk materials and features within specially fabricated test integrated circuits. Some experimental results obtained with such a system are detailed to illustrate its use and capabilities.

UR - http://www.scopus.com/inward/record.url?scp=84983979284&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84983979284&partnerID=8YFLogxK

U2 - 10.1002/sca.4950060201

DO - 10.1002/sca.4950060201

M3 - Article

AN - SCOPUS:84983979284

SN - 0161-0457

VL - 6

SP - 3

EP - 7

JO - Scanning

JF - Scanning

IS - 2

ER -

A low energy electron beam annealing system: Design, capability and use

Abstract

ASJC Scopus subject areas

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