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Towards high-speed, write-disturb tolerant 3D vertical RRAM arrays

  • Hong Yu Chen
  • , Bin Gao
  • , Haitong Li
  • , Rui Liu
  • , Peng Huang
  • , Zhe Chen
  • , Bing Chen
  • , Feifei Zhang
  • , Liang Zhao
  • , Zizhen Jiang
  • , Lifeng Liu
  • , Xiaoyan Liu
  • , Jinfeng Kang
  • , Shimeng Yu
  • , Yoshio Nishi
  • , H. S Philip Wong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

3D RRAM array suffers more serious reliability issues than 2D array due to the additional dimension involved. This paper systematically assesses the cell-location-dependent write-access (selected cells) and disturbance issues (unselected cells) for a 3D vertical RRAM array. Using a combination of experiments and simulations, a methodology is developed to enable array-level evaluation by conducting single-device measurements and without the need to fabricate a full 3D array. Based on this evaluation method, it is found that a double-sided bias (DSB) scheme improves write-disturb tolerance by a factor of 1800 and reduces write latency by 19 % under worst-case analyses.

Original languageEnglish (US)
Title of host publicationDigest of Technical Papers - Symposium on VLSI Technology
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479933310
DOIs
StatePublished - Sep 8 2014
Event34th Symposium on VLSI Technology, VLSIT 2014 - Honolulu, United States
Duration: Jun 9 2014Jun 12 2014

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
ISSN (Print)0743-1562

Other

Other34th Symposium on VLSI Technology, VLSIT 2014
Country/TerritoryUnited States
CityHonolulu
Period6/9/146/12/14

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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