Time-Dependent Capture Numbers with Repulsive Pair Interactions: Cu/Cu(111) and Ge/Si(001)

J. A. Venables; H. Brune; Jeffery Drucker

Time-Dependent Capture Numbers with Repulsive Pair Interactions: Cu/Cu(111) and Ge/Si(001)

J. A. Venables
, H. Brune
, Jeffery Drucker

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

Recent experiments and calculations have shown that weak repulsive interactions between adsorbate atoms may shift nucleation kinetics from the well-known diffusion limit towards the attachment-limited case. The distinctions between diffusion- and attachment-limited kinetics are clarified, and the increased importance of the transient nucleation regime in the latter case is shown to be due to a combination of delayed nucleation and reduced capture, A time-dependent interpolation scheme between attachment- and diffusion-limited capture numbers is proposed, and tested against KMC simulations. Using this scheme to interpret recent STM results on Cu/Cu(111), bounds on the maximum adatom-adatom potential repulsive energy of 12±2 meV are deduced. Time-dependent effects also occur in the growth and ripening of strained Ge islands on Si(001), and the similarities and differences between these two systems are discussed.

Original language	English (US)
Title of host publication	Materials Research Society Symposium - Proceedings
Editors	M.J. Aziz, N.C. Bartelt, I. Berbezier, J.B. Hannon, S.J. Hearne
Pages	17-22
Number of pages	6
Volume	749
State	Published - 2002
Event	Morphological and Compositional Evolution of Thin Films - Boston, MA, United States Duration: Dec 2 2002 → Dec 5 2002

Other

Other	Morphological and Compositional Evolution of Thin Films
Country/Territory	United States
City	Boston, MA
Period	12/2/02 → 12/5/02

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

Cite this

Time-Dependent Capture Numbers with Repulsive Pair Interactions: Cu/Cu(111) and Ge/Si(001). / Venables, J. A.; Brune, H.; Drucker, Jeffery.
Materials Research Society Symposium - Proceedings. ed. / M.J. Aziz; N.C. Bartelt; I. Berbezier; J.B. Hannon; S.J. Hearne. Vol. 749 2002. p. 17-22.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

@inproceedings{ea8f57ffaeb74e07b2acfc15fcf362e1,

title = "Time-Dependent Capture Numbers with Repulsive Pair Interactions: Cu/Cu(111) and Ge/Si(001)",

abstract = "Recent experiments and calculations have shown that weak repulsive interactions between adsorbate atoms may shift nucleation kinetics from the well-known diffusion limit towards the attachment-limited case. The distinctions between diffusion- and attachment-limited kinetics are clarified, and the increased importance of the transient nucleation regime in the latter case is shown to be due to a combination of delayed nucleation and reduced capture, A time-dependent interpolation scheme between attachment- and diffusion-limited capture numbers is proposed, and tested against KMC simulations. Using this scheme to interpret recent STM results on Cu/Cu(111), bounds on the maximum adatom-adatom potential repulsive energy of 12±2 meV are deduced. Time-dependent effects also occur in the growth and ripening of strained Ge islands on Si(001), and the similarities and differences between these two systems are discussed.",

author = "Venables, \{J. A.\} and H. Brune and Jeffery Drucker",

year = "2002",

language = "English (US)",

volume = "749",

pages = "17--22",

editor = "M.J. Aziz and N.C. Bartelt and I. Berbezier and J.B. Hannon and S.J. Hearne",

booktitle = "Materials Research Society Symposium - Proceedings",

note = "Morphological and Compositional Evolution of Thin Films ; Conference date: 02-12-2002 Through 05-12-2002",

}

TY - GEN

T1 - Time-Dependent Capture Numbers with Repulsive Pair Interactions

T2 - Morphological and Compositional Evolution of Thin Films

AU - Venables, J. A.

AU - Brune, H.

AU - Drucker, Jeffery

PY - 2002

Y1 - 2002

N2 - Recent experiments and calculations have shown that weak repulsive interactions between adsorbate atoms may shift nucleation kinetics from the well-known diffusion limit towards the attachment-limited case. The distinctions between diffusion- and attachment-limited kinetics are clarified, and the increased importance of the transient nucleation regime in the latter case is shown to be due to a combination of delayed nucleation and reduced capture, A time-dependent interpolation scheme between attachment- and diffusion-limited capture numbers is proposed, and tested against KMC simulations. Using this scheme to interpret recent STM results on Cu/Cu(111), bounds on the maximum adatom-adatom potential repulsive energy of 12±2 meV are deduced. Time-dependent effects also occur in the growth and ripening of strained Ge islands on Si(001), and the similarities and differences between these two systems are discussed.

AB - Recent experiments and calculations have shown that weak repulsive interactions between adsorbate atoms may shift nucleation kinetics from the well-known diffusion limit towards the attachment-limited case. The distinctions between diffusion- and attachment-limited kinetics are clarified, and the increased importance of the transient nucleation regime in the latter case is shown to be due to a combination of delayed nucleation and reduced capture, A time-dependent interpolation scheme between attachment- and diffusion-limited capture numbers is proposed, and tested against KMC simulations. Using this scheme to interpret recent STM results on Cu/Cu(111), bounds on the maximum adatom-adatom potential repulsive energy of 12±2 meV are deduced. Time-dependent effects also occur in the growth and ripening of strained Ge islands on Si(001), and the similarities and differences between these two systems are discussed.

UR - https://www.scopus.com/pages/publications/0141426624

UR - https://www.scopus.com/pages/publications/0141426624#tab=citedBy

M3 - Conference contribution

AN - SCOPUS:0141426624

VL - 749

SP - 17

EP - 22

BT - Materials Research Society Symposium - Proceedings

A2 - Aziz, M.J.

A2 - Bartelt, N.C.

A2 - Berbezier, I.

A2 - Hannon, J.B.

A2 - Hearne, S.J.

Y2 - 2 December 2002 through 5 December 2002

ER -

Time-Dependent Capture Numbers with Repulsive Pair Interactions: Cu/Cu(111) and Ge/Si(001)

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ASJC Scopus subject areas

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