Abstract
Thin films of amorphous carbon, silicon and germanium have been examined at high resolution at accelerating voltages up to 575 kV with the Cambridge University high resolution electron microscope. The directly interpretable resolution has been demonstrated to extend to 0ṁ22 nm, so that the microscope is capable of providing unambiguous structural information at the atomic level. The observations of both carbon and silicon were, however, somewhat disappointing in that no significant specimen detail was revealed despite the improved performance compared with that of conventional 100 kV instruments. Some of the factors involved in observation and interpretation of these images are discussed. 1980 Blackwell Science Ltd
Original language | English (US) |
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Pages (from-to) | 19-28 |
Number of pages | 10 |
Journal | Journal of Microscopy |
Volume | 119 |
Issue number | 1 |
DOIs | |
State | Published - May 1980 |
Externally published | Yes |
ASJC Scopus subject areas
- Pathology and Forensic Medicine
- Histology