Abstract
We present a method for microfabricating apertures in a silicon substrate using well-known cleanroom technologies resulting in highly reproducible giga-seal resistance bilayer formations. Using a plasma etcher, 150 μm apertures have been etched through a silicon wafer. Teflon™ has been chemically vapor deposited so that the surface resembles bulk Teflon and is hydrophobic. After fabrication, reproducible high resistance bilayers were formed and characteristic measurements of a self-inserted single OmpF porin ion channel protein were made.
Original language | English (US) |
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Pages (from-to) | 3307-3309 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 85 |
Issue number | 15 |
DOIs | |
State | Published - Oct 11 2004 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)