Single-electron effects in a point contact using side-gating in delta-doped layers

Kazuo Nakazato, Trevor J. Thornton, Julian White, Haroon Ahmed

Research output: Contribution to journalArticlepeer-review

43 Scopus citations


Side-gated point-contact structures in delta (δ)-doped layers have been used to form single-electron tunnel junctions with variable resistance. Clear Coulomb-blockade effects have been observed in the current-voltage characteristics. The measured characteristics are described in terms of a series of single-electron transistors formed by microsegments within the point contact. The effective tunnel capacitance and side-gate capacitance are estimated to be 10 and 1 aF, respectively, which are both one order of magnitude smaller than the reported capacitance of tunnel junctions made from Al or GaAs/AlGaAs heterostructures.

Original languageEnglish (US)
Pages (from-to)3145-3147
Number of pages3
JournalApplied Physics Letters
Issue number26
StatePublished - 1992
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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