Shallow source/drain extensions for deep submicron MOSFETs using spin-on-dopants

Chakravarthy Gopalan, Partha S. Chakraborty, Jinman Yang, Taehoon Kim, Zhiyuan Wu, Martha McCartney, Stephen Goodnick, Michael Kozicki, Trevor Thornton

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Spin-on-dopants and rapid thermal processing have been used to form ultra-shallow n+-p junctions with metallurgical junction depths as shallow as 12 nm as determined by secondary ion mass spectroscopy. The electrical junction depth and the total charge concentration have been measured in the vicinity of the junction using electron holography and are shown to be consistent with activation efficiencies of 80%. The ultra-shallow junctions have been used as the source and drain contacts of sub-100-nm gate length MOSFETs. From electrical measurements, the authors extract a lateral diffusion length for the source and drains that is comparable to the vertical extent of the n+-p junctions.

Original languageEnglish (US)
Pages (from-to)1277-1283
Number of pages7
JournalIEEE Transactions on Electron Devices
Issue number5
StatePublished - May 2003


  • Electron holography
  • Ultra-shallow source/drain

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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