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Quantum interference in the n-channel of a Si:SiGe quantum well
R. S. Prasad
,
T. J. Thornton
, A. Matsumura
, J. M. Fernandez
, D. Williams
Research output
:
Contribution to journal
›
Article
›
peer-review
9
Scopus citations
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Keyphrases
N-channel
100%
Quantum Interference
100%
Si MOSFET
100%
SiGe Quantum Well
100%
Temperature Effect
50%
Temperature Range
50%
Low Temperature
50%
Quantum Well
50%
2-dimensional Electron Gas (2DEG)
50%
Low Field
50%
Negative Magnetoresistance
50%
Strained Si
50%
Electron-phonon Scattering
50%
Gas Source Molecular Beam Epitaxy
50%
Weak Localization
50%
Intervalley Scattering
50%
Power Law Dependence
50%
Phase Coherence Length
50%
Dephasing Mechanism
50%
Physics
Quantum Wells
100%
Field Effect Transistor
66%
Temperature Dependence
33%
Magnetoresistance
33%
Electron Gas
33%
Phase Coherence
33%
Molecular Beam Epitaxy
33%
Phonon
33%
Material Science
Quantum Well
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
66%
Molecular Beam Epitaxy
33%
Magnetoresistance
33%
Dephasing
33%