Abstract
With the ongoing miniaturization of MOSFET structures into the nanometer domain, experimental results suggest there are physical limits up to which one can reduce the gate lengths. Furthermore, it becomes progressively more difficult to overcome the short channel effects at small gate lengths. This has led the researchers in the industry to look for alternative device technologies. One solution to the problem are the asymmetric device structures. In this work, we have simulated a 50 nm asymmetric MOS device structure using a two-dimensional Monte Carlo Poisson particle-based solver, in which quantum effects have been taken into account via the effective potential scheme. The quantum effects in these small device structures lead to strong quantum confinement of the carriers at the semiconductor/oxide interface, thus affecting the device drive current and the threshold voltage. We also show that the Silvaco Atlas simulations performed on the same device structure using the energy balance model were strongly affected by the choice of the energy relaxation times.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 347-354 |
| Number of pages | 8 |
| Journal | Superlattices and Microstructures |
| Volume | 34 |
| Issue number | 3-6 |
| DOIs | |
| State | Published - Sep 2003 |
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Electrical and Electronic Engineering
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