Phase transformation in FeSi2 nanowires

S. Liang, R. Islam, David Smith, Peter Bennett

Research output: Contribution to journalArticlepeer-review

28 Scopus citations


We report the formation of β-FeSi2 nanowires (NWs) on Si(1 1 0), produced by annealing s-FeSi2 NWs at 800 °C. These two phases of iron silicide are semiconducting and metallic, respectively, in thin film form. The s-phase NWs are formed by reactive deposition at 700 °C and have average dimensions of 5 nm thick×8 nm wide×3 μm long. Both are endotaxial, meaning they grow into the substrate along inclined Si{1 1 1} planes. The transformation temperature is higher than observed in thin films, due to the small thickness and large interface area of the NWs, which stabilize the s-phase.

Original languageEnglish (US)
Pages (from-to)166-171
Number of pages6
JournalJournal of Crystal Growth
Issue number2
StatePublished - Oct 1 2006


  • A1. Epitaxy
  • A1. Nanowires
  • A1. Phase transformation
  • B1. Nanomaterials

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry


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