Performance of customized control charts to detect process disturbances

Alejandro Heredia-Langner; Douglas C. Montgomery; George C. Runger; Connie M. Borror; Richard I. Post

doi:10.1002/qre.390

Performance of customized control charts to detect process disturbances

Alejandro Heredia-Langner, Douglas C. Montgomery, George C. Runger, Connie M. Borror, Richard I. Post

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the traditional approach. Contrast-based charts have superior detection capabilities than the traditional approach when targeted at specific process disturbances.

Original language	English (US)
Pages (from-to)	205-218
Number of pages	14
Journal	Quality and Reliability Engineering International
Volume	17
Issue number	3
DOIs	https://doi.org/10.1002/qre.390
State	Published - May 2001
Externally published	Yes

Keywords

EWMA
Orthogonal contrasts
Process monitoring
Semiconducter manufacturing

ASJC Scopus subject areas

Safety, Risk, Reliability and Quality
Management Science and Operations Research

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10.1002/qre.390

Cite this

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abstract = "In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the traditional approach. Contrast-based charts have superior detection capabilities than the traditional approach when targeted at specific process disturbances.",

keywords = "EWMA, Orthogonal contrasts, Process monitoring, Semiconducter manufacturing",

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year = "2001",

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AU - Montgomery, Douglas C.

AU - Runger, George C.

AU - Borror, Connie M.

AU - Post, Richard I.

PY - 2001/5

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AB - In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the traditional approach. Contrast-based charts have superior detection capabilities than the traditional approach when targeted at specific process disturbances.

KW - EWMA

KW - Orthogonal contrasts

KW - Process monitoring

KW - Semiconducter manufacturing

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Performance of customized control charts to detect process disturbances

Abstract

Keywords

ASJC Scopus subject areas

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