In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the traditional approach. Contrast-based charts have superior detection capabilities than the traditional approach when targeted at specific process disturbances.
- Orthogonal contrasts
- Process monitoring
- Semiconducter manufacturing
ASJC Scopus subject areas
- Safety, Risk, Reliability and Quality
- Management Science and Operations Research